晶體缺陷

晶體缺陷（英語：crystallographic defect）是指晶體結構中週期性的排列規律被打破的情況^[1]^[2]^[3]^[4]。理想的晶體，具有週期性的晶體結構（這稱為「長程有序」）。原子或分子的位置以固定的距離重複，這個距離由晶體的晶格常數決定。然而，在大多數的實際晶體中，原子或分子的排列並非如此完美，這樣就造成了晶體缺陷。

主要分類

點缺陷
- 晶格空位（Vacancy defect）或肖特基缺陷（Schottky defect）
- 間隙缺陷（Interstitial defect）或弗倫克爾缺陷（Frenkel defect）
- 雜質替換
線缺陷
- 刃位錯（edge dislocation）
- 螺旋位錯（screw dislocation）
- 向錯（disclination）
面缺陷
- 晶粒邊界（grain boundary）
- 反相疇界 (antiphase boundary)
- 堆垛錯誤（stacking faults）
- 孿晶界（twin boundary）
體缺陷

參考文獻

^ P. Ehrhart, Properties and interactions of atomic defects in metals and alloys Archive.is的存檔，存檔日期2013-02-03, volume 25 of Landolt-Börnstein, New Series III, chapter 2, p. 88, Springer, Berlin, 1991
^ R. W. Siegel, Atomic Defects and Diffusion in Metals, in Point Defects and Defect Interactions in Metals, J.-I. Takamura (ED.), p. 783, North Holland, Amsterdam, 1982
^ J. H. Crawford and L. M. Slifkin (編). Point Defects in Solids. New York: Plenum Press. 1975.
^ G. D. Watkins, Native defects and their interactions with impurities in silicon, in Defects and Diffusion in Silicon Processing, T. Diaz de la Rubia, S. Coffa, P. A. Stolk, and C. S. Rafferty (eds), vol. 469 of MRS Symposium Proceedings, p. 139, Materials Research Society, Pittsburgh, 1997 ISBN 1558993738

延伸閱讀

Hagen Kleinert, Gauge Fields in Condensed Matter, Vol. II, "Stresses and defects" （頁面存檔備份，存於網際網路檔案館）, pp. 743–1456, World Scientific (Singapore, 1989); Paperback ISBN 9971-5-0210-0
Hermann Schmalzried: Solid State Reactions. Verlag Chemie, Weinheim 1981, ISBN 3-527-25872-8.

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[Erh91-1] P. Ehrhart, Properties and interactions of atomic defects in metals and alloys Archive.is的存檔，存檔日期2013-02-03, volume 25 of Landolt-Börnstein, New Series III, chapter 2, p. 88, Springer, Berlin, 1991

[2] R. W. Siegel, Atomic Defects and Diffusion in Metals, in Point Defects and Defect Interactions in Metals, J.-I. Takamura (ED.), p. 783, North Holland, Amsterdam, 1982

[3] J. H. Crawford and L. M. Slifkin (編). Point Defects in Solids. New York: Plenum Press. 1975.

[4] G. D. Watkins, Native defects and their interactions with impurities in silicon, in Defects and Diffusion in Silicon Processing, T. Diaz de la Rubia, S. Coffa, P. A. Stolk, and C. S. Rafferty (eds), vol. 469 of MRS Symposium Proceedings, p. 139, Materials Research Society, Pittsburgh, 1997 ISBN 1558993738

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